Semiconductor Equipment and Materials International
Resource Information
The organization Semiconductor Equipment and Materials International represents an institution, an association, or corporate body that is associated with resources found in Sydney Jones Library, University of Liverpool.
The Resource
Semiconductor Equipment and Materials International
Resource Information
The organization Semiconductor Equipment and Materials International represents an institution, an association, or corporate body that is associated with resources found in Sydney Jones Library, University of Liverpool.
- Label
- Semiconductor Equipment and Materials International
- Authority link
- http://id.loc.gov/authorities/names/n90682619
117 Items by the Organization Semiconductor Equipment and Materials International
Context
Context of Semiconductor Equipment and Materials InternationalContributor of
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- Twenty third IEEE/CPMT International Electronics Manufacturing Technology Symposium : proceedings 1998 IEMT symposium : October 19-21, 1998, Austin, TX, USA
- 17th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : ASMC 2006, May 22-24, 2006, Boston, MA
- ASMC 2000 proceedings : 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : advancing the science of semiconductor manufacturing excellence : September 12-14, 2000, Boston, Massachusetts, USA
- ASMC 2003 : the 14th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : (ASMC) Advancing the science and technology of semiconductor manufacturing : 31 March-1 April, 2003, Munich, Germany
- ASMC 2004 : the 15th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : Advancing the science and technology of semiconductor manufacturing : May 4-6, 2004, Seaport Hotel, Boston, Massachusetts, USA
- ASMC 2008 : [IEEE/SEMI Advanced Semiconductor Manufacturing Conference : 5-7 May, 2008, Cambridge, Massachusetts
- ASMC 99 : 10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : [proceedings] : September 8-10, 1999, the Fairmont Copley Plaza, Boston, Massachusetts, USA
- Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
- Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI : date, 14-16 May 2013
- Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI : date, 19-21 May 2014
- Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI : date, 3-6 May 2015
- Advanced Semiconductor Manufacturing Conference : [proceedings]
- Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California
- Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
- Advances in resist technology and processing XIII : 11-13 March 1996, Santa Clara, California
- Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California
- Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA
- Advances in resist technology and processing XV : 23-25 February, 1998, Santa Clara, California
- Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
- Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA
- Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA
- Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA
- Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA
- Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
- Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
- Display technologies II : 9-11 July 1998, Taipei, Taiwan
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
- Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA
- Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA
- Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
- IEEE International Symposium on Semiconductor Manufacturing conference proceedings
- IEEE/CPMT International Electronics Manufacturing Technology Symposium : [proceedings]
- IEEE/CPMT/SEMI 28th International Electronics Manufacturing Technology Symposium : July 16-18, 2003, the Marriott Hotel, San Jose, CA, USA
- IEEE/SEMI 1995 Advanced Semiconductor Manufacturing Conference and Workshop : theme--semiconductor manufacturing: economic solutions for the 21st century : ASMC 95 proceedings, November 13-15, 1995, Cambridge, Massachusetts
- IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : ASMC '92 proceedings, September 30-October 1, 1992, Cambridge, Massachusetts
- IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : theme, "Factory of the future" : ASMC '93 proceedings, October 18-19, 1993, Boston, Massachusetts
- IEMT 2004 : 29th IEEE/CPMT/SEMI International Electronics Manufacturing Technology (IEMT) [Symposium] : July 14-16, 2004, the Marriott Hotel, San Jose, California, U.S.A.
- ISSM 2006 : conference proceedings : the Thirteenth International Symposium on Semiconductor Manufacturing : September 25-27, 2006, Century Hyatt Tokyo, Tokyo, Japan
- In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas
- Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California
- Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California
- MEMS components and applications for industry, automobiles, aerospace, and communication : 22-23 October 2001, San Francisco, USA
- MEMS components and applications for industry, automobiles, aerospace, and communication II : 28-29 January 2003, San Jose, California, USA
- MEMS/MOEMS components and their applications II : 24-25 January 2005, San Jose, California, USA
- MOEMS and miniaturized systems : 18-20 September 2000, Santa Clara, USA
- MOEMS and miniaturized systems II : 22-24 October, 2001, San Francisco, USA
- MOEMS and miniaturized systems III : 27-29 January 2003, San Jose, California, USA
- MOEMS display and imaging systems : 28-29 January 2003, San Jose, California, USA
- Materials and device characterization in micromachining : 21-22 September, 1998, Santa Clara, California
- Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA
- Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California
- Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California
- Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California
- Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA
- Metrology, inspection, and process control for microlithography XVI : 4-7 March, 2002, Santa Clara, [California] USA
- Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA
- Metrology, inspection, and process control for microlithography XVIII : 23-26 February 2004, Santa Clara, California, USA
- Microelectronic device and multilevel interconnection technology II : 16-17 October, 1996, Austin, Texas
- Microelectronic manufacturing yield, reliability, and failure analysis II : 16-17 October, 1996, Austin, Texas
- Microelectronic structures and MEMS for optical processing II : 14-15 October 1996, Austin, Texas
- Microelectronic structures and MEMS for optical processing III : 29-30 September, 1997, Austin, Texas
- Microelectronic structures and MEMS for optical processing IV : 21-22 September, 1998, Santa Clara, California
- Microelectronic structures and microelectromechanical devices for optical processing and multimedia applications : 24 October, 1995, Austin, Texas
- Microfluidic devices and systems : 21-22 September, 1998, Santa Clara, California
- Microfluidics and bioMEMS : 22-24 October 2001, San Francisco, [California] USA
- Microfluidics, bioMEMS, and medical microsystems : 27-29 January 2003, San Jose, California, USA
- Microfluidics, bioMEMS, and medical microsystems III : 24-26 January 2005, San Jose, California, USA
- Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas
- Micromachined devices and components : 23-24 October, 1995, Austin, Texas
- Micromachined devices and components II : 14-15 October 1996, Austin, Texas
- Micromachined devices and components III : 29 September 1997, Austin, Texas
- Micromachined devices and components IV : 21-22 September, 1998, Santa Clara, California
- Micromachined devices and components VI : 18-19 September 2000, Santa Clara, USA
- Micromachining and microfabrication process technology : 23-24 October, 1995, Austin, Texas
- Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas
- Micromachining and microfabrication process technology III : 29-30 September, 1997, Austin, Texas
- Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
- Micromachining and microfabrication process technology VI : 18-20 September 2000, Santa Clara, USA
- Micromachining and microfabrication process technology VII : 22-24 October, 2001, San Francisco, [California] USA
- Micromachining and microfabrication process technology VIII : 27-29 January, 2003, San Jose, California, USA
- Micromachining and microfabrication process technology X : 25-27 January 2005, San Jose, California, USA
- Micromachining technology for micro-optics : 20 September 2000, Santa Clara, USA
- Micromachining technology for micro-optics and nano-optics : 28-29 January 2003, San Jose, California, USA
- Micromachining technology for micro-optics and nano-optics III : 25-27 January 2005, San Jose, California, USA
- Multichip modules : international conference and exhibition, 13-15 April 1994, Denver, Colorado
- Multilevel interconnect technology : 1-2 October 1997, Austin, Texas
- Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium, October 14-16, 1996, Austin, Texas, USA
- Optical characterization techniques for high-performance microelectronic device manufacturing III : 16-17 October 1996, Austin, Texas
- Optical microlithography IX : 13-15 March, 1996, Santa Clara, California
- Optical microlithography X : 12-14 March, 1997, Santa Clara, California
- Optical microlithography XI : 25-27 February, 1998, Santa Clara, California
- Optical microlithography XII : 17-19 March, 1999, Santa Clara, California
- Optical microlithography XIII : 1-3 March, 2000, Santa Clara, [California], USA
- Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA
- Optical microlithography XV : 5-8 March, 2002, Santa Clara, [California], USA
- Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA
- Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA
- Optical/laser microlithography VII : 2-4 March 1994, San Jose, California
- Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California
- Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan
- Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan
- Proceedings of ISSM2000 : the Ninth [IEEE] International Symposium on Semiconductor Manufacturing : September 26-28, 2000, Hotel East 21 Tokyo, Tokyo, Japan
- Process, equipment, and materials control in integrated circuit manufacturing : 25-26 October 1995, Austin, Texas
- Process, equipment, and materials control in integrated circuit manufacturing II : 16-17 October 1996, Austin, Texas
- Reliability, packaging, testing, and characterization of MEMS/MOEMS IV : 24-25 January 2005, San Jose, California, USA
- Reliability, testing, and characterization of MEMS/MOEMS : 22-24 October 2001, San Francisco, USA
- Reliability, testing, and characterization of MEMS/MOEMS II : 27-29 January 2003, San Jose, California, USA
- Twenty Seventh Annual IEEE/CPMT/SEMI International Electronics Manufacturing Technology Symposium : [proceedings] : July 17-18, 2002, the Fairmont Hotel, San Jose, CA, USA
- Twenty Sixth IEEE/CPMT International Electronics Manufacturing Technology Symposium : proceedings : 2000 IEMT Symposium : October 2-3,2000, Santa Clara, CA, USA
- Twenty first IEEE/CPMT International Electronics Manufacturing Technology Symposium, October 13-15, 1997, Austin, TX, USA
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.liverpool.ac.uk/resource/lJ6Z8RAfjxA/" typeof="Organization http://bibfra.me/vocab/lite/Organization"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.liverpool.ac.uk/resource/lJ6Z8RAfjxA/">Semiconductor Equipment and Materials International</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.liverpool.ac.uk/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.liverpool.ac.uk/">Sydney Jones Library, University of Liverpool</a></span></span></span></span></div>
