The Resource Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)

Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)

Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
Title
Emerging lithographic technologies VIII
Title remainder
24-26 February 2004, Santa Clara, California, USA
Statement of responsibility
R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH
Title variation
  • Emerging lithographic technologies 8
  • Emerging lithographic technologies eight
Contributor
Editor
Editor
Subject
Genre
Language
eng
Member of
Cataloging source
NHM
Illustrations
illustrations
Index
index present
LC call number
TK7874
LC item number
.E56 2004
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Mackay, R. Scott
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • International SEMATECH
Series statement
Proceedings of SPIE,
Series volume
5374
http://library.link/vocab/subjectName
  • Lithography, Electron beam
  • Microlithography
  • X-ray lithography
  • X-rays
  • Masks (Electronics)
Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxxviii, 1110 p.)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote
Label
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA, R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH, (electronic book)
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Dimensions
28 cm.
Dimensions
unknown
Extent
2 v. (xxxviii, 1110 p.)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
ill.
Reproduction note
Electronic resource.
Specific material designation
remote

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